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IC1000™ CMP pad

IC1000™ CMP pad

The IC1000™ series of pads for chemical mechanical planarization (CMP) is the industry standard.

Applications
  • Copper bulk, tungsten, STI/Ceria, oxide, buff
Solutions
  • CMP Pads
 
 
 

Features & benefits

  • Industry- standard hard pad for multiple applications
  • World-class quality and performance consistency
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    Product Details

    Fabric/material

    CMP PADS POLYMERICS

    Design

    IC1000 A3 PAD (032) 1 01

    Seam

    IC A3 32 W/T X

    Packaging

    CMP PADS POLYMERICS

    Hazard

    Coated Material

    CMP PADS POLYMERICS

    Features

    CMP PADS POLYMERICS
     
     
     
    Technical Resources
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      Safety Data Sheets(All Languages)
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        Other CMP Applications

        Our CMP pads cover a wide range of applications and technology nodes. To further explore Dupont CMP pads, see our overview of the product families by application

         
         
         
         
         
         
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