Suba™ CMP Pads

Suba™ CMP Pads

DuPont's Suba™ pads are chemical mechanical planarization (CMP) pads for stock, intermediate and final polish.

Applications
  • Polishing fragile crystals or other delicate surfaces
  • Polishing glass, quartz, ceramics, special metals and plastic
  • Silicon wafer polishing
Solutions
  • CMP Pads
 
 
 
 
 
 
 
 
 
 
 
 
Product Details

Fabric/material

R/N PAD RESALE

Design

SUBA 840 PAD 1422x 450m

Seam

null

Packaging

R/N PAD RESALE

Hazard

Coated Material

DE19717

Features

R/N PAD RESALE
 
 
 
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    Safety Data Sheets(All Languages)
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